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Power nano- and picosecond optoelectronic switches based on high-voltage silicon structures with p-n-junctions. I. Physics of switching process

机译:基于高压的功率纳米和皮秒光电开关   具有p-n结的硅结构。一,切换过程的物理学

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摘要

Numerical simulation of switching process of high-voltage siliconphotodiodes, phototransistors and photothyristors those triggered-onhomogeneously over the area by picosecond laser pulses, has been performed forthe first time. The analysis of results allowed to obtain "empirical"relationship between key parameters of switches (energy of control pulses, aradiation absorption coefficient, the area of structures) and parameters thosecharacterizing the switching process in a circuit with the resistive load. Forsome of these relationship the approximate analytical formulas which seem to bequite adequate to the simulation results has been deduced. It is noted thatdistinctions between switching processes in structures of the three differenttypes become apparent only at long duration of voltage pulses at a final stagewhen the blocking capability of photodiodes and phototransistors is recovered.
机译:首次进行了皮秒激光脉冲在区域内非均匀触发的高压硅光电二极管,光电晶体管和光电晶闸管的开关过程的数值模拟。结果分析允许获得开关的关键参数(控制脉冲的能量,辐射吸收系数,结构的面积)和表征电阻负载电路中的开关过程的参数之间的“经验”关系。对于这些关系中的某些,已经推导了似乎足以满足模拟结果的近似分析公式。要注意的是,三种不同类型的结构中的开关过程之间的区别仅在恢复光电二极管和光电晶体管的阻挡能力的最后阶段在长的电压脉冲持续时间下才变得明显。

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  • 作者

    Kyuregyan, A. S.;

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  • 年度 2016
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  • 原文格式 PDF
  • 正文语种 ru
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